Accession Number : ADA310758

Title :   Design of Imaging Materials for use with Photogenerated Base. Radiation Induced Beta-Elimination to Yield Poly(4-Hydroxystyrene).

Descriptive Note : Technical rept.,

Corporate Author : CORNELL UNIV ITHACA NY BAKER LAB

Personal Author(s) : Frechet, Jean M. ; Urankar, Edward J. ; Brehm, Isabella ; Niu, Q. J. ; Wynne, Kenneth J.

PDF Url : ADA310758

Report Date : 30 JUN 1996

Pagination or Media Count : 4

Abstract : The search for chemically amplified resist and imaging materials that are resistant to airborne contaminants has led us to explore new routes to resist imaging. The use of photogenerated base is particularly attractive since several stable photoprecursors of amines and other bases have been developed. We have now designed a novel family of polymers that undergo base catalyzed Beta-elimination to afford poly(p-hydroxystyrene). Although the active units of the polymers are different, their basic design is analogous to that of the well known family of t-BOC resists (1) that operate on the basis of acid-catalyzed side chain deprotection. Several polymers and copolymers containing base labile pendant groups have been prepared. Their use as chemically amplified imaging and resist materials is described.

Descriptors :   *RADIATION, *MATERIALS, *IMAGES, *ELIMINATION REACTIONS, PHOTOCHEMICAL REACTIONS, POLYMERS, RESISTANCE, AIRBORNE, STYRENES, COPOLYMERS, PHOTORESIST COATINGS, LITHOGRAPHY, AMINES, CONTAMINANTS, CATALYSIS, HYDROXYL RADICALS, ACIDS.

Subject Categories : Polymer Chemistry
      Radiation and Nuclear Chemistry
      Coatings, Colorants and Finishes
      Laminates and Composite Materials
      Printing and Graphic Arts
      Optics

Distribution Statement : APPROVED FOR PUBLIC RELEASE