Accession Number : ADA313724

Title :   Single Crystal Epitaxial Germanium Based Ohmic Contact Structure for III-V and Nanoelectronic and Mesoscopic Devices.

Descriptive Note : Technical rept.,

Corporate Author : ARMY RESEARCH LAB FORT MONMOUTH NJ

Personal Author(s) : Dubey, Madan ; Jones, Kenneth A. ; Casas, Luis M. ; Eckart, Donald W. ; Pfeffer, Robert L.

PDF Url : ADA313724

Report Date : AUG 1996

Pagination or Media Count : 18

Abstract : The single crystal epitaxial layer ohmic contacts are very promising in the fabrication of shallow junction nanoelectronic and mesoscopic devices based on III-V compounds. A single crystal Ge film is grown epitaxially on GaAs or InGaP lattice matched to GaAs and a Au or Pd layer is deposited on top of it using an Ultra High Vacuum (10(exp -9 -10 Torr) Electron Beam (UHV E-Beam) deposition system. The interface between the Ge and thermally cleaned GaAs or InGaP is almost atomically abrupt, smooth and oxide free, and there is a minimum of disruption of the underlying layers. When deposited at an appropriate temperature, the metals are highly oriented and have large grains. They can be diffused through the Ge film to initiate the formation on an ohmic contact in a controlled manner. A detailed analysis of interface quality, crystal structure and defect propagation in GaAs/Ge/Au, GaAs/Ge/Pd, InGaP/Ge structures is presented. High resolution Transmission Electron Microscopy (HRTEM), Double Crystal X-ray Diffraction (DXRD), Rutherford Backscattering Spectroscopy (RBS) and Auger Electron Spectroscopy (AES) were used to characterize the materials.

Descriptors :   *SINGLE CRYSTALS, *EPITAXIAL GROWTH, *GROUP III COMPOUNDS, *GROUP IV COMPOUNDS, *GROUP V COMPOUNDS, *GERMANIUM, METALS, SPECTROSCOPY, INTERFACES, X RAY DIFFRACTION, FABRICATION, ELECTRON BEAMS, OXIDES, JUNCTIONS, AUGER ELECTRON SPECTROSCOPY, ELECTRIC CONTACTS, ULTRAHIGH VACUUM.

Subject Categories : Inorganic Chemistry
      Physical Chemistry
      Electrical and Electronic Equipment
      Crystallography

Distribution Statement : APPROVED FOR PUBLIC RELEASE