Accession Number : ADA316558
Title : Growth Facility for Nanocomposite Films.
Descriptive Note : Final rept. 1 Sep 93-31 Aug 94,
Corporate Author : MISSOURI UNIV-COLUMBIA
Personal Author(s) : White, Henry W.
PDF Url : ADA316558
Report Date : 23 SEP 1996
Pagination or Media Count : 8
Abstract : Two facilities were constructed for synthesis of protective thin films. The first system utilized the recently developed Laser Absorption Wave Deposition (LAWD) technique. With this technique multiple layers of ultrahard carbon films can be grown directly on a variety of surfaces. A pulsed infrared laser is used to create a highly ionized plasma in an atmosphere of a gas mixture, such as methane in hydrogen, into which a plume of ablation particles from a suitably placed target are brought. The ablation particles can be coated and deposited on a substrate. The second system utilized Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition (ECR-PECVD). This technique can be used to grow a wide variety of thin films using a microwave plasma source. The energy of arriving adatoms varies from a few to several hundred eV. Films will be grown and characterized under a three year, separately funded ARO program for the growth of protective films on structural substrates such as Fe, W and Ta.
Descriptors : *COMPOSITE MATERIALS, *THIN FILMS, ABLATION, SOURCES, SYNTHESIS, LAYERS, STRUCTURAL PROPERTIES, GROWTH(GENERAL), PLASMAS(PHYSICS), FACILITIES, CHEMICAL VAPOR DEPOSITION, MICROWAVES, SUBSTRATES, PULSED LASERS, HYDROGEN, GASES, MIXTURES, IRON, DEPOSITION, PARTICLES, IONIZATION, ABSORPTION, PLUMES, METHANE, TANTALUM, INFRARED PULSES, TUNGSTEN, WAVES, ELECTRON PARAMAGNETIC RESONANCE, CYCLOTRON RESONANCE, ADATOMS.
Subject Categories : Laminates and Composite Materials
Plasma Physics and Magnetohydrodynamics
Distribution Statement : APPROVED FOR PUBLIC RELEASE