Accession Number : ADA318474
Title : Chamber Studies of Photolysis and Hydroxyl Radical Reactions of Trifluoroiodomethane.
Descriptive Note : Final technical rept. Jun 94-Jul 95,
Corporate Author : ARMSTRONG LAB TYNDALL AFB FL ENVIRONICS DIRECTORATE
Personal Author(s) : Markgraf, Stewart J. ; Wells, J. R. ; Wiseman, Floyd L.
PDF Url : ADA318474
Report Date : 30 APR 1996
Pagination or Media Count : 49
Abstract : Decay rate measurements were conducted in Teflon chambers for the photolysis and hydroxyl radical reactions of trifluoroiodomethane (CF3I). Photolysis studies were conducted outdoors, and results showed that photolysis of CF3I is dependent upon cloud cover. Half-lives for CF3I photolysis ranged from a few days to a few weeks. Hydroxyl radical rate studies were conducted by generating the hydroxyl radicals in Situ using standard techniques. CF3I decay was monitored using standard spectrometric techniques. Results of the hydroxyl studies were poor due to extensive detection interferences and side reactions, although results indicated that photolysis is a more significant degradation pathway for CF3I than the second-order reaction with hydroxyl.
Descriptors : *PHOTOLYSIS, *CHAMBERS, *HYDROXYL RADICALS, MEASUREMENT, DEGRADATION, SPECTROMETRY, CHEMICAL REACTIONS, ORGANIC COMPOUNDS, DECAY, TETRAFLUOROETHYLENE RESINS, SIDE REACTIONS.
Subject Categories : Organic Chemistry
Distribution Statement : APPROVED FOR PUBLIC RELEASE