Accession Number : ADA318506
Title : Microcolumn Arrays for Nanolithography.
Descriptive Note : Final rept. 15 Sep 93-14 Sep 96,
Corporate Author : IBM THOMAS J WATSON RESEARCH CENTER YORKTOWN HEIGHTS NY
Personal Author(s) : Chang, T. H.
PDF Url : ADA318506
Report Date : 15 SEP 1993
Pagination or Media Count : 161
Abstract : This program is to explore a novel method, based on arrays of miniaturized electron beam columns operating in parallel (for lithography in the 100 nm and below linewidth regime). It requires no mask and can bse exteneded to the sub-25 nm linewidth regime. It offers the potential of a low cost, high throughput manufacturing process for the new generation of ultradense, ultrafast devices. The objective of the current program is to develop the base technologies for the electron beam microcolumn and the related lithographic processes to allow its feasibility for high throughput multi-beam lithography to be evaluated. This is a joint IBM Research/Cornell University project with IBM focusing on microcolumn development, pattern generation and simple array multi-beam operation, and Cornell on low voltage lithographic processes, aspects of advanced field emission studies, and novel column fabrication techniques. This report covers only the activities at IBM Research.
Descriptors : *PHOTOLITHOGRAPHY, OPTIMIZATION, ELECTROOPTICS, ELECTRON SCATTERING, ARRAYS, CHIPS(ELECTRONICS), PARALLEL PROCESSING, CURRENT DENSITY, ELECTRON BEAMS, FIELD EMISSION, MICROELECTRONICS, EMITTERS, MULTIPLE BEAMS(RADIATION), CATHODES(ELECTRON TUBES), PATTERN MAKING.
Subject Categories : Printing and Graphic Arts
Electrical and Electronic Equipment
Distribution Statement : APPROVED FOR PUBLIC RELEASE