Accession Number : ADA319434
Title : High Surface Area Electrode Research.
Descriptive Note : Final technical rept. 10 Jul-31 Dec 96,
Corporate Author : NORTH CAROLINA STATE UNIV AT RALEIGH DEPT OF MATERIALS SCIENCE AND ENGINEERING
Personal Author(s) : Roberson, S. ; Davis, R. F.
PDF Url : ADA319434
Report Date : 31 DEC 1996
Pagination or Media Count : 11
Abstract : Molybdenum nitride (MOxN (x=l or 2)) films, 15 micron thick, have been deposited via chemical vapor deposition (CVD) on 50 micron thick polycrystalline titanium substrates using molybdenum pentachloride (MoCl5) and NH3 in a cold wall reactor with vertical pancake heaters. The surface morphology of the films was slightly porous but did not contain the large cracks typical of high surface area MOxN films prepared by conversion of MoO3. Debye-Scherrer calculations indicate that the average particle size of the films was approximately 50 nm. The CvD MOxN films had a two-phase structure which appeared to be 60% d-MoN and 40% g-Mo2N. Energy dispersive X-ray (EDX) data did not reveal the presence of oxygen and chlorine in films deposited above 6000 C. Electrode evaluation via AC impedance spectroscopy and cyclic voltammetry indicates that CVD films were capacitive with a voltage stability of 0.9 volts in 6.4M KOH.
Descriptors : *CHEMICAL VAPOR DEPOSITION, *ELECTRODES, TEST AND EVALUATION, PARTICLE SIZE, STABILITY, SPECTROSCOPY, CRACKS, MORPHOLOGY, ENERGY, VOLTAGE, MOLYBDENUM, ALTERNATING CURRENT, X RAYS, CYCLES, NITRIDES, SURFACES, OXYGEN, SURFACE PROPERTIES, CHLORIDES, TITANIUM, IMPEDANCE, VOLTAMMETRY, TWO PHASE FLOW, CHLORINE, DISPERSIONS, POLYCRYSTALLINE.
Subject Categories : Industrial Chemistry and Chemical Processing
Electrical and Electronic Equipment
Distribution Statement : APPROVED FOR PUBLIC RELEASE