Accession Number : ADA321189

Title :   Microcontamination Sensor for VLSI Semiconductor Manufacturing.

Descriptive Note : Final rept. 23 Jul 96-23 Jan 97,

Corporate Author : LOS GATOS RESEARCH MOUNTAIN VIEW CA

Personal Author(s) : Vujkovic-Cvijin, Pajo

PDF Url : ADA321189

Report Date : 23 JAN 1997

Pagination or Media Count : 19

Abstract : Feasibility demonstration of a trace-level water vapor sensor has been performed in Phase 1. The sensor is critically needed in semiconductor industry, where trace concentrations of water in highly reactive gases used in Very Large Scale Integration (VLSI) manufacturing decrease significantly the yield of IC chips produced. The sensor described is based on optical spectroscopy in the middle infrared region, and uses a novel laser source, based on nonlinear frequency conversion. In Phase 1 we have demonstrated both the feasibility of producing such a source (diode laser-pumped, room-temperature operation), and the feasibility of its application for sensitive frequency-modulation spectroscopy of water vapor in the middle infrared region. The results achieved open up the potential to develop a novel optical microsensor capable of reaching the required ultra-high detection sensitivity in a package suitable for use in industrial environments.

Descriptors :   *VERY LARGE SCALE INTEGRATION, *SEMICONDUCTORS, *INFRARED DETECTORS, *WATER VAPOR, LASER PUMPING, MICROSTRUCTURE, INFRARED SPECTROSCOPY, MANUFACTURING, CHIPS(ELECTRONICS), LASER APPLICATIONS, FREQUENCY CONVERSION, LITHIUM NIOBATES, INFRARED SPECTRA, REACTIVE GASES, DIODE LASERS.

Subject Categories : Electrical and Electronic Equipment
      Infrared Detection and Detectors
      Lasers and Masers

Distribution Statement : APPROVED FOR PUBLIC RELEASE