Accession Number : ADA321245

Title :   Vapor Deposition Equipment and Thin Film Processing.

Descriptive Note : Final rept.,

Corporate Author : FLORIDA AGRICULTURAL AND MECHANICAL UNIV TALLAHASSEE

Personal Author(s) : Gielisse, P. J. ; Niculescu, H. ; Xu, Y. ; Bai, N. ; Tu, M.

PDF Url : ADA321245

Report Date : AUG 1996

Pagination or Media Count : 57

Abstract : Work under the contract has provided a vapor deposition facility for the generation of thin films and film structures (devices) for structural and electronic applications. Efforts have been expanded into the actual deposition of films in the systems AlN, (Al,B)N, c-BN (cubic boron nitride) and Si-Al-O-N. We report on the resultant physical, chemical, materials and electronic properties and surface characteristics of the films. In certain cases multilayer film structures have been characterized as well. Device application include high thermal conductivity electronic substrates, device coatings, energy storage capacitor structures, electron emission surfaces (cold cathodes) and low-wear high-strength materials.

Descriptors :   *THIN FILMS, *VAPOR DEPOSITION, ELECTRONICS, LAYERS, STRUCTURAL PROPERTIES, PROCESSING, ELECTROMAGNETIC PROPERTIES, FILMS, CHEMICAL VAPOR DEPOSITION, STRENGTH(MECHANICS), NITROGEN, OXYGEN, COATINGS, SURFACE PROPERTIES, ELECTRON EMISSION, ALUMINUM, SILICON, WEAR, THERMAL CONDUCTIVITY, ENERGY STORAGE, CAPACITORS, COLD CATHODE TUBES, BORON NITRIDES.

Subject Categories : Inorganic Chemistry
      Physical Chemistry
      Electrical and Electronic Equipment
      Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE