Accession Number : ADA323298
Title : A Process Model and Complementary Experiments for the Electron Cyclotron Resonance (ECR) Technology: Application to Deposition and Etching. Phase II.
Descriptive Note : Final rept.,
Corporate Author : SCIENTIFIC RESEARCH ASSOCIATES INC GLASTONBURY CT
Personal Author(s) : Meyyappan, M. ; Govindan, T. R. ; deJong, F. ; Buggeln, R. C.
PDF Url : ADA323298
Report Date : DEC 1996
Pagination or Media Count : 106
Abstract : This Phase II SBIR project was undertaken to model the Electron Cyclotron Resonance (ECR) based plasma processing with a view to understanding plasma mechanisms and aiding in process and equipment design. Models of various complexity levels were successfully developed and applied to ECR discharges. The computer codes were used to study the effects of flow rates, pressure, microwave power and reactor geometry parameters on the process figures of merit. This allows understanding of the ECR mechanisms in various electropositive and reactive discharges. The model and code are useful in design of new generation plasma equipment and also in process design and optimization. A graphical user interface was also developed for the easy use of one of the codes.
Descriptors : *FABRICATION, *SEMICONDUCTOR DEVICES, COMPUTERIZED SIMULATION, OPTIMIZATION, MICROWAVE EQUIPMENT, ETCHING, FIGURE OF MERIT, ELECTRON PARAMAGNETIC RESONANCE, CYCLOTRON RESONANCE, RADIOFREQUENCY POWER, GRAPHICAL USER INTERFACE.
Subject Categories : Electrical and Electronic Equipment
Mfg & Industrial Eng & Control of Product Sys
Distribution Statement : APPROVED FOR PUBLIC RELEASE