Accession Number : ADA326133

Title :   Vapour Phase Growth of Thick Monocrystalline GaN Epitaxial Layers by Sandwich-Method.

Descriptive Note : Interim rept. no. 1, 22 Aug-1 Dec 96,

Corporate Author : JOINT STOCK CO AGENCY FOR SCIENCE AND TECHNOLOGY SAINT PETERSBURG (RUSSIA)

Personal Author(s) : Mokov, E. N. ; Voda kov, Yu. A. ; Roenkov, A. D. ; Baranov, P. G. ; Boiko, M. E.

PDF Url : ADA326133

Report Date : 01 DEC 1996

Pagination or Media Count : 14

Abstract : We have modified a setup for growing GaN heteroepitaxial layers of large area and obtained 20 such structures on silicon carbide (SiC) and sapphire (Al2O3) substrates of 8 mm2 in size 50-150 micrometers thickness by Sublimation Sandwich Method (SSM). The substrates have been analysed for optimal GaN layer growth conditions, using the available data, and the results indicated that hexagonal SiC (alpha-SiC) is the best material. The substrate/epilayer mismatches may be reduced by using Al-doped substrates pre-irradiated by high energy particles. We have studied the characteristics and structural quality of GaN layers deposited on SiC substrates, using X-ray diffractometry. The rocking curve measurements of GaN layers yielded the full width at the half maximum (FWHM) of 150 arc.sec. The manganese impurity was first observed and identified in GaN crystals grown by sublimation sandwich method by electron paramagnetic resonance.

Descriptors :   *EPITAXIAL GROWTH, *SILICON CARBIDES, *GALLIUM COMPOUNDS, X RAY DIFFRACTION, SINGLE CRYSTALS, SUBSTRATES, NITRIDES, SAPPHIRE, CRYSTAL DEFECTS, THERMAL EXPANSION, SUBLIMATION, RUSSIA, DOPING, ELECTRON PARAMAGNETIC RESONANCE, SANDWICH CONSTRUCTION, MANGANESE.

Subject Categories : Crystallography
      Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE