Accession Number : ADA326192

Title :   Growth and Structure of MBE-Deposited Iridium Silicide.

Descriptive Note : Final technical rept. 1 Apr 95-31 Mar 96,

Corporate Author : ARIZONA RESEARCH LABS TUCSON

Personal Author(s) : Falco, Charles M.

PDF Url : ADA326192

Report Date : SEP 1996

Pagination or Media Count : 6

Abstract : We were able to form pure Tr-Si3 films at temperatures as low as 450 deg C, which is almost 200 deg C lower than previously reported. With our MBE growth techniques we also found a previously-unreported c-axis epitaxial IrSi3 growth mode at 700 deg C, found that the IrSi3 epitaxy on Si (111) was dominated by a Mode B orientation which had not previously been reported in the literature, as well as showed that the epitaxial growth of IrSe3 on was superior to that on Si(100).

Descriptors :   *CRYSTAL STRUCTURE, *EPITAXIAL GROWTH, *SILICIDES, *IRIDIUM, *MOLECULAR BEAM EPITAXY, FILMS.

Subject Categories : Inorganic Chemistry
      Crystallography
      Physical Chemistry

Distribution Statement : APPROVED FOR PUBLIC RELEASE