Accession Number : ADA326535

Title :   Particulate Contaminant Formation and Transport in Microelectronic Manufacturing Processes. Phase II.

Descriptive Note : Quarterly rept. no. 5,

Corporate Author : CFD RESEARCH CORP HUNTSVILLE AL

Personal Author(s) : Stout, Phillip J. ; Krishnan, Anantha ; Rao, N. P. ; Girshick, Steven L. ; Kushnet, Mark J.

PDF Url : ADA326535

Report Date : MAY 1997

Pagination or Media Count : 11

Abstract : This is the fifth quarterly report documenting the work performed during a two year Phase II STTR activity entitled 'Particulate contaminant formation and transport in microelectronic manufacturing processes.' The overall objective is to produce a charging, transport, and growth simulation (CTGS) tool that can be used effectively by equipment manufacturers and users to reduce particle generation in fabrication systems.

Descriptors :   *MICROELECTRONICS, *CONTAMINANTS, COMPUTERIZED SIMULATION, IONS, MODELS, GROWTH(GENERAL), PLASMAS(PHYSICS), FABRICATION, NUCLEATION, CHARGED PARTICLES, COMPUTATIONAL FLUID DYNAMICS, REDUCTION, SILANES, TRANSPORT, INSTRUMENTATION, PARTICULATES, SILICON COMPOUNDS, DRAG, ELECTROSTATICS.

Subject Categories : Physical Chemistry
      Electrical and Electronic Equipment
      Fluid Mechanics
      Plasma Physics and Magnetohydrodynamics
      Computer Programming and Software

Distribution Statement : APPROVED FOR PUBLIC RELEASE