Accession Number : ADA326535
Title : Particulate Contaminant Formation and Transport in Microelectronic Manufacturing Processes. Phase II.
Descriptive Note : Quarterly rept. no. 5,
Corporate Author : CFD RESEARCH CORP HUNTSVILLE AL
Personal Author(s) : Stout, Phillip J. ; Krishnan, Anantha ; Rao, N. P. ; Girshick, Steven L. ; Kushnet, Mark J.
PDF Url : ADA326535
Report Date : MAY 1997
Pagination or Media Count : 11
Abstract : This is the fifth quarterly report documenting the work performed during a two year Phase II STTR activity entitled 'Particulate contaminant formation and transport in microelectronic manufacturing processes.' The overall objective is to produce a charging, transport, and growth simulation (CTGS) tool that can be used effectively by equipment manufacturers and users to reduce particle generation in fabrication systems.
Descriptors : *MICROELECTRONICS, *CONTAMINANTS, COMPUTERIZED SIMULATION, IONS, MODELS, GROWTH(GENERAL), PLASMAS(PHYSICS), FABRICATION, NUCLEATION, CHARGED PARTICLES, COMPUTATIONAL FLUID DYNAMICS, REDUCTION, SILANES, TRANSPORT, INSTRUMENTATION, PARTICULATES, SILICON COMPOUNDS, DRAG, ELECTROSTATICS.
Subject Categories : Physical Chemistry
Electrical and Electronic Equipment
Plasma Physics and Magnetohydrodynamics
Computer Programming and Software
Distribution Statement : APPROVED FOR PUBLIC RELEASE