Accession Number : ADA328365
Title : Trivalent Phosphors for ACTFEL Applications.
Descriptive Note : Final rept. 20 Jun 94-19 Jun 97,
Corporate Author : OREGON STATE UNIV CORVALLIS DEPT OF ELECTRICAL AND COMPUTER ENGINEERING
Personal Author(s) : Wager, J. F.
PDF Url : ADA328365
Report Date : 09 JUL 1997
Pagination or Media Count : 8
Abstract : The original goal of this ASSERT research program was to extend our alternating-current thin-film electroluminescent (ACTFEL) device physics research in a new direction; namely, exploration of the potential of several classes of phosphor materials (trivalent oxides, nitrides, and oxynitrides) deposited by rf magnetron sputtering for ACTFEL thin-film display applications. This goal was modified to the exploration of certain divalent and trivalent nitrides such as CaSiN2:Eu and AlInN2:Tm for ACTFEL phosphor applications. This goal redirection is motivated by the perceived superior electron injection and transport properties of nitrides compared to oxides or oxynitrides. In order to achieve this goal, many modifications of the rf sputtering system and of the sputter target preparation system and handling procedure were undertaken. Additionally, a significant portion of the research effort was devoted to the development of high-quality insulators. The last phase of this research program was devoted to rf sputtering of ZnS:Tb phosphors in order to confirm that the sputter system is performing as desired and to test the viability of N acceptor doping as a means of improving the performance of sulfur-based ACTFEL phosphors.
Descriptors : *ELECTROLUMINESCENCE, *THIN FILMS, *ALTERNATING CURRENT, *VALENCE, *PHOSPHORS, CALCIUM, INJECTION, MATERIALS, DISPLAY SYSTEMS, NITRIDES, TRANSPORT PROPERTIES, ELECTRONS, PHYSICS, OXIDES, ALUMINUM, DOPING, ELECTRON ACCEPTORS, INDIUM, SPUTTERING, RADIOFREQUENCY, THULIUM, EUROPIUM, MAGNETRONS, OXYNITRIDES, TERBIUM.
Subject Categories : Inorganic Chemistry
Radiation and Nuclear Chemistry
Electricity and Magnetism
Distribution Statement : APPROVED FOR PUBLIC RELEASE