Accession Number : ADA330666

Title :   Microfabricating a NANOSCILLOSCOPE: Probing Local Device Fields Using AC Scanning Force Microscopy.

Descriptive Note : Interim rept. 1 May-31 Aug 96,

Corporate Author : DELAWARE UNIV NEWARK DEPT OF ELECTRICAL AND COMPUTER ENGINEERING

Personal Author(s) : Van der Weide, D. W. ; Nauzil, P. ; Agrawal, V.

PDF Url : ADA330666

Report Date : 25 OCT 1997

Pagination or Media Count : 5

Abstract : Several ground-breaking results were achieved during the past year: The first combined scanning force/electric field probes were fabricated, tested and published. These results showed unprecedented spatial and temporal resolution of approximately 100 nm and 10 ps, respectively, when they were used to measure ultrafast electronic circuits. The approach taken was to modify commercial scanning probe microscope (SPM) probe tips with coaxial shields, then connect them directly to a 50 GHz sampling oscilloscope, a considerable simplification over laser-based systems for probing integrated circuits, yet much more flexible than commercial needle probes. This work has generated significant interest in the industry, and tech-transfer activities and discussions are ongoing with a number of companies, since, for the first time, it is possible to simultaneously locate sub-micrometer features (using the SPM feature to see sample topography) and electrically probe these features. Another significant accomplishment was the design, development and publication of the first combined high frequency magnetic field and topography probe tip. This invention was used to probe a coplanar waveguide sample at 10 GHz, mapping out the normal component of the magnetic field together with sample topography for the first time. This probe could prove especially useful in understanding new superconducting logic elements.

Descriptors :   *PROBES, *TOPOGRAPHY, MAGNETIC FIELDS, HIGH FREQUENCY, WAVEGUIDES, INTEGRATED CIRCUITS, ALTERNATING CURRENT, LOGIC ELEMENTS, MICROSCOPES.

Subject Categories : Test Facilities, Equipment and Methods
      Mfg & Industrial Eng & Control of Product Sys
      Photography

Distribution Statement : APPROVED FOR PUBLIC RELEASE