Accession Number : ADA330747
Title : A Facility for the Attribute-Based Vapor Phase Processing of Multilayers and Coatings
Descriptive Note : Final rept. 26 Jun 95-25 Jun 96
Corporate Author : HARVARD COLL CAMBRIDGE MA PRESIDENT AND FELLOWS
Personal Author(s) : Evans, Anthony G.
PDF Url : ADA330747
Report Date : 26 JUN 1997
Pagination or Media Count : 18
Abstract : An electron beam deposition system suitable for the intelligent processing of oxide films and coatings has been designed and constructed. The three major features include (1) a heated substrate with a rotating stage (2) magnetically rastered e-beam dual sources, (3) four sub-systems for measuring film properties either in situ or post situ. The latter include: (a) an infrared imaging system, (b) a beam curvature apparatus for stress measurement, (c) an atomic force microscope to quantify topography. The system is being applied to oxide films relevant to thermal barrier applications (notably ZrO2) as well as alumina, ytrria and other oxides suitable for oxidation protection. The deposited films are being subject to a measurement protocol that determines their residual strain state, their fracture toughness and their adhesion to alloy substrates.
Descriptors : *VAPOR DEPOSITION, *PROTECTIVE COATINGS, TOUGHNESS, TOPOGRAPHY, FRACTURE(MECHANICS), ELECTRON BEAMS, INFRARED IMAGES, RESIDUAL STRESS, OXIDATION RESISTANCE.
Subject Categories : Coatings, Colorants and Finishes
Test Facilities, Equipment and Methods
Distribution Statement : APPROVED FOR PUBLIC RELEASE