Accession Number : ADA331050
Title : Surface Chemistry in Electrochemical Atomic Layer Processing
Descriptive Note : Final rept. Apr 91-Apr 96
Corporate Author : GEORGIA UNIV ATHENS DEPT OF CHEMISTRY
Personal Author(s) : Stickney, John L.
PDF Url : ADA331050
Report Date : 16 OCT 1997
Pagination or Media Count : 4
Abstract : Atomic layer processing involves the formation and/or etching of materials an atomic layer at a time. Atomic layer epitaxy is the most obvious example, where a thin film of a material is formed an atomic layer at a time. That is, surface limited reactions are used to deposit individual atomic layers of the elements making up a compound. These reactions are used in a cycle, where each cycle results in the formation of a monolayer of the compound. The present studies were designed to investigate these surface limited reactions. To determine what the structures of the deposits were, and how that structure influenced subsequent deposition.
Descriptors : *THIN FILMS, *ELECTROCHEMISTRY, *SURFACE CHEMISTRY, *ATOMIC LAYER EPITAXY, LAYERS, MATERIALS, STRUCTURES, ETCHING, SURFACE REACTIONS, ELECTRODEPOSITION, CADMIUM COMPOUNDS.
Subject Categories : Physical Chemistry
Atomic and Molecular Physics and Spectroscopy
Distribution Statement : APPROVED FOR PUBLIC RELEASE