Accession Number : ADA331050

Title :   Surface Chemistry in Electrochemical Atomic Layer Processing

Descriptive Note : Final rept. Apr 91-Apr 96

Corporate Author : GEORGIA UNIV ATHENS DEPT OF CHEMISTRY

Personal Author(s) : Stickney, John L.

PDF Url : ADA331050

Report Date : 16 OCT 1997

Pagination or Media Count : 4

Abstract : Atomic layer processing involves the formation and/or etching of materials an atomic layer at a time. Atomic layer epitaxy is the most obvious example, where a thin film of a material is formed an atomic layer at a time. That is, surface limited reactions are used to deposit individual atomic layers of the elements making up a compound. These reactions are used in a cycle, where each cycle results in the formation of a monolayer of the compound. The present studies were designed to investigate these surface limited reactions. To determine what the structures of the deposits were, and how that structure influenced subsequent deposition.

Descriptors :   *THIN FILMS, *ELECTROCHEMISTRY, *SURFACE CHEMISTRY, *ATOMIC LAYER EPITAXY, LAYERS, MATERIALS, STRUCTURES, ETCHING, SURFACE REACTIONS, ELECTRODEPOSITION, CADMIUM COMPOUNDS.

Subject Categories : Physical Chemistry
      Fabrication Metallurgy
      Crystallography
      Atomic and Molecular Physics and Spectroscopy

Distribution Statement : APPROVED FOR PUBLIC RELEASE