Accession Number : ADA332887
Title : Advanced Pulsed Laser Deposition System with In-Situ Ellipsometric Diagnostics
Descriptive Note : Final technical rept. 1 Aug 95-31 Jul 97
Corporate Author : MICHIGAN UNIV ANN ARBOR CENTER FOR ULTRAFAST OPTICAL SCIENCE
Personal Author(s) : Pronko, Peter
PDF Url : ADA332887
Report Date : 06 NOV 1997
Pagination or Media Count : 13
Abstract : The proposal described and requested funding for part of what is intended to become a larger system representing an optics-based research facility for ultrafast pulsed laser deposition and characterization of modulated films, coatings, and surface structures. An in-situ diagnostics approach is used as a process control, through real-time feedback, in manufacturing multilayer thin films and coatings. Experimental facilities employing optical techniques, in conjunction with other more conventional particle monitoring and control methods, provides new and advanced capability, as well as greater insight, into complex thin-film fabrication. Such insight has been, and continues to be, demanded by sophisticated industrial and government end users. The present program is aimed at establishing a multi-port pulsed laser vacuum deposition chamber with an in-situ multi-wavelength ellipsometer to be used as an optical diagnostic and feedback control device. This system will be attached to a versatile high average power ultrafast pulsed laser for the experimental development and fabrication of modulated thin-film materials and multilayers. It is intended to be a collaborative and interdisciplinary research facility set up at the Center for Ultrafast Optical Science at the University of Michigan.
Descriptors : *OPTICS, *PULSED LASERS, *DEPOSITION, *ELLIPSOMETERS, METHODOLOGY, HIGH RATE, MANUFACTURING, MONITORING, REAL TIME, LAYERS, MATERIALS, STRUCTURES, THIN FILMS, FILMS, FABRICATION, RESEARCH FACILITIES, LASERS, SURFACES, COATINGS, PARTICLES, FEEDBACK, POWER, MODULATION, MULTISPECTRAL.
Subject Categories : Lasers and Masers
Distribution Statement : APPROVED FOR PUBLIC RELEASE