Accession Number : ADA337453

Title :   (AASERT 94) Intelligent Control of Materials Processes

Descriptive Note : Final rept. 1 Sep 94-31 Aug 97

Corporate Author : CINCINNATI UNIV OH DEPT OF ELECTRICAL AND COMPUTER ENGINEERING

Personal Author(s) : Garrett, Patrick H.

PDF Url : ADA337453

Report Date : JAN 1998

Pagination or Media Count : 3

Abstract : A systematic set of experiments has been performed to determine the effect of temperature, oxygen, precursor composition, and precursor flow rate on the gas phase of chemical vapor deposition.

Descriptors :   *CHEMICAL VAPOR DEPOSITION, PREVENTIVE MAINTENANCE, PRECURSORS, FLOW RATE, FUZZY LOGIC.

Subject Categories : Mfg & Industrial Eng & Control of Product Sys

Distribution Statement : APPROVED FOR PUBLIC RELEASE