Accession Number : ADA337684

Title :   Single Wafer Plasma Reactor Simulator

Descriptive Note : Final rept. 16 Mar 94-15 May 97

Corporate Author : ARIZONA BOARD OF REGENTS TEMPE OFFICE OF RESEARCH AND CREATIVE ACTIVITIES

Personal Author(s) : Kristof, John J.

PDF Url : ADA337684

Report Date : 25 JUL 1997

Pagination or Media Count : 8

Abstract : The report contains information on ARPA ASSERT AFORSR #F49620-94-1-0167, Single wafer plasma reactor simulator. This information includes details of the objectives of the ASSERT project to optimize single wafer design and operation, and focuses on a protocol known as Programmed Rate Chemical Vapor Deposition. Justification for deviation from the original proposal, verification of time savings using this protocol, and transactions communicating and disseminating this protocol to interested parties are discussed. Sections in the report include Accomplishments/New Findings (e.g., the time savings verification), personnel supported, associated personnel, publications, transactions, and interactions explaining the work are also included, as well as future work to which this research could be applied.

Descriptors :   *CHEMICAL VAPOR DEPOSITION, *SEMICONDUCTING FILMS, VERIFICATION, TEST METHODS, WAFERS.

Subject Categories : Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE