Accession Number : ADA337684
Title : Single Wafer Plasma Reactor Simulator
Descriptive Note : Final rept. 16 Mar 94-15 May 97
Corporate Author : ARIZONA BOARD OF REGENTS TEMPE OFFICE OF RESEARCH AND CREATIVE ACTIVITIES
Personal Author(s) : Kristof, John J.
PDF Url : ADA337684
Report Date : 25 JUL 1997
Pagination or Media Count : 8
Abstract : The report contains information on ARPA ASSERT AFORSR #F49620-94-1-0167, Single wafer plasma reactor simulator. This information includes details of the objectives of the ASSERT project to optimize single wafer design and operation, and focuses on a protocol known as Programmed Rate Chemical Vapor Deposition. Justification for deviation from the original proposal, verification of time savings using this protocol, and transactions communicating and disseminating this protocol to interested parties are discussed. Sections in the report include Accomplishments/New Findings (e.g., the time savings verification), personnel supported, associated personnel, publications, transactions, and interactions explaining the work are also included, as well as future work to which this research could be applied.
Descriptors : *CHEMICAL VAPOR DEPOSITION, *SEMICONDUCTING FILMS, VERIFICATION, TEST METHODS, WAFERS.
Subject Categories : Solid State Physics
Distribution Statement : APPROVED FOR PUBLIC RELEASE