Accession Number : ADA337685

Title :   Establish Methods for Crystal Growth of Si-Ge

Descriptive Note : Final rept. Aug 95-Feb 97

Corporate Author : PARKE MATHEMATICAL LABS INC LOWELL MA

Personal Author(s) : Adamski, Joseph A. ; Bailey, John S.

PDF Url : ADA337685

Report Date : OCT 1997

Pagination or Media Count : 16

Abstract : The SiGe alloy system will result in a whole new set of high performance electronic and optoelectronics devices, such as, thermoelectric generators, infrared detectors, and high speed optical transmitter-receivers. The production of high speed SiGe devices has been limited by thin-film alloy growth techniques which are compatible with silicon substrates. The alloy composition of thin films is limited because of strain between the substrate and the thin film. This contractual effort is aimed at producing bulk alloy SiGe crystals of uniform composition for use as substrates. These new substrates will expand the range of lattice-matched thin film alloys available for development of high speed SiGe devices. SiGe alloy electronic devices offer some advantages over III-V and II-VI compound semiconductors Their chemical and thermo-mechanical. properties will allow them to be closely compatible with established Si processing techniques and Si integrated circuits.

Descriptors :   *THIN FILMS, *CRYSTAL GROWTH, THERMOMECHANICS, CHEMICAL PROPERTIES, SUBSTRATES, GROUP V COMPOUNDS, SOLID SOLUTIONS, GROUP II-VI COMPOUNDS, GERMANIUM ALLOYS, SILICON ALLOYS.

Subject Categories : Properties of Metals and Alloys
      Crystallography

Distribution Statement : APPROVED FOR PUBLIC RELEASE