Accession Number : ADD000340
Title : Chemical Laser Nozzle System.
Descriptive Note : Patent,
Corporate Author : DEPARTMENT OF THE AIR FORCE WASHINGTON D C
Personal Author(s) : Dobrzelecki,Arthur ; Buggein,Richard C
Report Date : 15 Oct 1974
Pagination or Media Count : 6
Abstract : The patent discloses a novel laser nozzle system for use in any chemical laser in which a first gaseous reactant, a second gaseous reactant, and a diluent gas can be used. A preferred embodiment includes: a first nozzle which is dimensioned and is configurated to induce and to promote the supersonic flow of the first gaseous reactant through the first nozzle; a second nozzle which is positioned downstream both from the first nozzle and from the supersonic flow of the first gaseous reactant, and which is dimensioned and is configurated to continue the supersonic flow of the first gaseous reactant through the second nozzle; and, a plurality of hollow conduits which are disposed both in a transverse attitude to the second nozzle, and downstream of the second nozzle, with each conduit of the plurality having a first plurality of orifices. The nozzle system is readily adaptable to meet the varying parametric requirements of different chemical lasers such as HF.
Descriptors : *Chemical lasers, *Nozzles, *Patents, Fluid flow, Mixing, Gas flow, Gas dynamics, Hydrogen fluoride
Subject Categories : Lasers and Masers
Distribution Statement : APPROVED FOR PUBLIC RELEASE