Accession Number : ADD002374
Title : Collimated X-Ray Source for X-Ray Lithographic System.
Descriptive Note : Patent,
Corporate Author : DEPARTMENT OF THE AIR FORCE WASHINGTON D C
Personal Author(s) : Fenstermacher,Thomas E
Report Date : 30 Mar 1976
Pagination or Media Count : 7
Abstract : The patent relates to an X-ray lithographic system-high power X-ray illumination of photo-resist coated substrate members accomplished by projecting a collimated X-ray beam, emitted from an extended area X-ray source, through the patterned apertures of an X-ray absorbent mask. Improved efficiency is achieved by limiting X-ray emission to the discrete portions of the extended area emission surface that corresponds to related patterned mask apertures.
Descriptors : *Lithography, *Patents, X ray apparatus, Photomasking, X rays, Collimators
Subject Categories : Printing and Graphic Arts
Distribution Statement : APPROVED FOR PUBLIC RELEASE