Accession Number : ADD002923

Title :   Analog Flueric Gas Concentration Sensor.

Descriptive Note : Patent,

Corporate Author : DEPARTMENT OF THE ARMY WASHINGTON D C

Personal Author(s) : Villarroel,Fernando

Report Date : 13 Nov 1973

Pagination or Media Count : 4

Abstract : In the patent a flueric gas concentration sensor consisting of two identical flow channels exhausting to a common output chamber is described. A reference gas is introduced into one of said flow channels and an unknown sample gas is introduced into the other. Both gases are drawn through the respective channels by a suction unit connected to the common output chamber. Each respective flow channel consists of one linear flueric resitor, one small cavity, and one quadratic flueric resistor. The pressure differential between the respective small cavities is measured as an indication of the concentration of the unknown sample gas.

Descriptors :   *Flueric devices, *Gas analysis, *Patents, Pressure measurement, Sampling, Gas flow, Detectors

Subject Categories : Fluidics and Fluerics

Distribution Statement : APPROVED FOR PUBLIC RELEASE