Accession Number : ADD004898

Title :   Chemical Polish for BaF2 and CaF2.

Descriptive Note : Patent,

Corporate Author : DEPARTMENT OF THE ARMY WASHINGTON D C

Personal Author(s) : Harrington,James A ; Gregory,Don A

Report Date : 09 Aug 1977

Pagination or Media Count : 4

Abstract : Disclosed are a method and the chemical solutions (a blend of H2SO4 and CH3COOH) employed for producing high quality crystal surfaces on CaF2 and BaF2 by a chemical polishing cycle that follows a multistage mechanical polishing cycle. The high quality crystal surfaces on CaF2 and BaF2, which otherwise are of the quality for field of use, makes these crystals ideally suited for applications as windows for HF/DF laser since the chemically polished crystal surface has fewer irregularities which reduce the amount of surface scattering of the HF/DF radiation, thus allowing a more predictable output. The high quality surfaces achieved from chemical polishing are of particular value in the study of optical absorption of very low loss materials, where the scattered radiation produces heat. (Author)

Descriptors :   *Patents, *Polishes, *Single crystals, *Infrared windows, Calcium fluorides, Fluorides, Barium compounds, Polishing

Subject Categories : Lasers and Masers
      Mfg & Industrial Eng & Control of Product Sys
      Crystallography

Distribution Statement : APPROVED FOR PUBLIC RELEASE