Accession Number : ADD005292

Title :   Pulsed X-Ray Lithography.

Descriptive Note : Patent Application,

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON D C

Personal Author(s) : Nagel,David J ; Peckerar,Martin C

Report Date : 15 Aug 1978

Pagination or Media Count : 9

Abstract : A method and means for x-ray lithography which utilizes means for producing in a vacuum system a high-temperature plasma from which soft x-rays are emitted. The x-rays pass through a mask exposing an x-ray resist on a substrate to produce the desired pattern on the substrate. The x-ray spectrum has a significant energy in the 1-5 keV range. These x-rays pass through the support layer of the mask, stop in the pattern material (gold) of the mask or, where the pattern material is lacking, are absorbed adequately by the x-ray resist. Since there is very little energy above 5 keV, there is little if any substrate damage due to the x-rays. (Author)

Descriptors :   *Patent applications, *Lithography, X rays, Plasmas(Physics)

Subject Categories : Printing and Graphic Arts

Distribution Statement : APPROVED FOR PUBLIC RELEASE