Accession Number : ADD006261

Title :   Process for Chemical Vapor Deposition of a Homogeneous Alloy of Refractory Metals.

Descriptive Note : Patent,

Corporate Author : DEPARTMENT OF THE ARMY WASHINGTON DC

Personal Author(s) : Glaski,Fred A

Report Date : 06 Feb 1977

Pagination or Media Count : 7

Abstract : A coating of refactory metals alloy, e.g. an alloy of tantalum and tungsten, is deposited on a substrate, such as the bore of a gun barrel, by reacting an alloy of the refractory metals with chlorine to form a mixture of the vapors of the refractory metal chlorides and reacting the resulting mixture of vapors with hydrogen to reduce the metal chlorides to the free metals. The alloy coating thus deposited possesses a finer grain structure and is more homogeneous and ductile than one obtained by chlorinating the tantalum and tungsten metals separately. (Author)

Descriptors :   *Patents, *Vapor deposition, *Tantalum alloys, *Gun barrels, Refractory metal alloys, Tungsten, Chlorination, Hydrogen, Reduction(Chemistry)

Subject Categories : Fabrication Metallurgy

Distribution Statement : APPROVED FOR PUBLIC RELEASE