Accession Number : ADD006954
Title : Optical Lithographic Method for Fabrication of Submicron Wide Lines.
Descriptive Note : Patent Application,
Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC
Personal Author(s) : Wilcox,Howard A
Report Date : 17 Sep 1979
Pagination or Media Count : 14
Abstract : The present invention relates to a method of fabricating submicron wide lines (0.15-0.30 micron) using optical lithograhic techniques. This has been accomplished by depositing a first layer of etchable material on the substrate. A second layer of material is formed on the first layer. A third layer of material is deposited on the second layer at an angle to the substrate normal so that the third layer is partially shadowed by the raised edge of the second layer. A fourth layer of material is deposited normal to the substrate on the third layer and through the elongated opening onto the elongated widened strip of the substrate so as to form a very narrow line thereon, the fourth layer being etch resistant. Finaly, the first, second, third, and fourth layers are removed so as to leave the very narrow line of the substrate.
Descriptors : *Patent applications, *Lithography, *Etching, Fabrication, Optics, Layers, Substrates, Width, Josephson junctions, Semiconductor devices
Subject Categories : Mfg & Industrial Eng & Control of Product Sys
Solid State Physics
Distribution Statement : APPROVED FOR PUBLIC RELEASE