Accession Number : ADD007586

Title :   Method of Delineating a Desired Integrated Circuit Pattern Upon a Circuit Substrate.

Descriptive Note : Patent Application,

Corporate Author : DEPARTMENT OF THE ARMY WASHINGTON DC

Personal Author(s) : Helbert,John N ; Pittman,Charles U , Jr

Report Date : 22 May 1980

Pagination or Media Count : 7

Abstract : The general object of this invention is to provide a method of delineating a desired integrated circuit pattern upon a circuit substrate. A more specific object of the invention is to provide such a method in which the resist sensitivity is improved without a sacrifice in resolution.

Descriptors :   *Patent applications, *Lithography, *Electron beams, *Integrated circuits, Acrylates, Polymethyl methacrylate, Ionizing radiation, Substrates, Spinning(Industrial processes), Silicon, Polymeric films, Inventions, Circuits

Subject Categories : Physical Chemistry
      Electrical and Electronic Equipment
      Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE