Accession Number : ADD007596

Title :   Method of Chemically Polishing a Doubly Rotated Quartz Plate.

Descriptive Note : Patent Application,

Corporate Author : DEPARTMENT OF THE ARMY WASHINGTON DC

Personal Author(s) : Vig,John R ; Brandmayr,Ronald J

Report Date : 08 May 1980

Pagination or Media Count : 16

Abstract : The general object of this invention is to provide a method of chemically polishing a doubly rotated quartz plate. A more particular object of the invention is to provide such a method that will chemically polish a doubly rotated quartz plate whose theta angle is between about 33 deg and 36 deg and whose phi angle is between about 10 deg and 26 deg. A particular object of the invention is to provide a method of chemically polishing an SC-cut doubly rotated quartz plate. Another object of the invention is to provide a method of making quartz plates of great strength suitable for high shock resonator applications. (Author)

Descriptors :   *Patent applications, *Polishing, *Plates, *Quartz, Rotation, Surface roughness, Quartz resonators, Etching, Ammonium compounds, Fluorides, Strength(Mechanics), Shock resistance, Abrasives, Aluminum oxides, Hydrofluoric acid, Diffusion, Surface finishing

Subject Categories : Ceramics, Refractories and Glass
      Mfg & Industrial Eng & Control of Product Sys

Distribution Statement : APPROVED FOR PUBLIC RELEASE