Accession Number : ADD008283

Title :   Method of Making Thin Antireflection Coating for Electro-Optical Device.

Descriptive Note : Patent,

Corporate Author : DEPARTMENT OF THE ARMY WASHINGTON DC

Personal Author(s) : Pollehn,Herbert K ; Bratton,Jerry L

Report Date : 01 Jul 1980

Pagination or Media Count : 4

Abstract : Described is an absorbing coating consisting of three layers sequentially deposited on the aluminized phosphor screen of an electro-optical device such as an image intensifier. The layers are: a transparent dielectric layer with a thickness of about one quarter wavelength of radiation to be absorbed, a thin metal semitransparent layer, and an aluminum oxide protective layer for the thin metal layer. The coating is transparent to electrons bombarding the phosphor, but absorbs radiation which might pass through the photocathode and be reflected from the phosphor aluminum coating back to the photocathode. Such reflected radiation can cause spurious output electrons from the photocathode. (Author)

Descriptors :   *Patents, *Antireflection coatings, *Dielectric films, *Metal coatings, *Ceramic coatings, *Photocathodes, Electrooptics, Protective coatings, Semitransparence, Transparence, Electrons, Image intensifiers(Electronics), Aluminum oxides, Laminates, Inventions

Subject Categories : Electrooptical and Optoelectronic Devices
      Coatings, Colorants and Finishes

Distribution Statement : APPROVED FOR PUBLIC RELEASE