Accession Number : ADD008847

Title :   Apparatus and Methods for Submicron Pattern Generation.

Descriptive Note : Patent,

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s) : Jelks,Edward C

Report Date : 14 Jul 1981

Pagination or Media Count : 8

Abstract : An apparatus and method are provided for depositing submicron patterns on a substrate. The apparatus includes an evaporative source located opposite the substrate so that molecules from the source can be deposited directly on the substrate. A mask is located between the evaporative source and the substrate, the mask having openings which correspond to the desired pattern to be deposited on the substrate. A plate is located between the mask and the substrate, the plate having an aperture for allowing evaporated molecules to be deposited on the substrate according to the pattern of the mask. (Author)

Descriptors :   *Patents, *Deposition, *Thin films, *Substrates, Photomasking, Pattern making, Inventions, Molecules, Methodology, Photoresistors, Photolithography, Electron beams

Subject Categories : Mfg & Industrial Eng & Control of Product Sys

Distribution Statement : APPROVED FOR PUBLIC RELEASE