Accession Number : ADD008887
Title : Mask-Slice Alignment Method.
Descriptive Note : Patent,
Corporate Author : DEPARTMENT OF THE AIR FORCE WASHINGTON DC
Personal Author(s) : Watts,Roderick K
Report Date : 29 Sep 1981
Pagination or Media Count : 4
Abstract : The present invention relates broadly to the alignment of objects, and in particular to the automatic alignment of an x-ray mask on a semiconductor slice. The present invention utilizes a matching alignment pattern pair for the automatic alignment of an x-ray mask to a semiconductor wafer or disc. A light transmissive pattern which provides orientation in the x-y direction is inscribed on a semiconductor slice. The x-ray mask has a matching pattern which is an opaque or negative pattern with respect to the semiconductor slice pattern. The pattern on the semiconductor slice provides a transmissive window from which the light rays that illuminate the semiconductor slice, can escape. Either The semiconductor slice or the x-ray mask may be automatically moved to minimize the light signal that has passed through first the slice and then the mask.
Descriptors : *Patents, *Photomasking, *Alignment, Semiconductors, Patterns, Infrared detectors, Matching, X rays
Subject Categories : Solid State Physics
Distribution Statement : APPROVED FOR PUBLIC RELEASE