Accession Number : ADD008887

Title :   Mask-Slice Alignment Method.

Descriptive Note : Patent,

Corporate Author : DEPARTMENT OF THE AIR FORCE WASHINGTON DC

Personal Author(s) : Watts,Roderick K

Report Date : 29 Sep 1981

Pagination or Media Count : 4

Abstract : The present invention relates broadly to the alignment of objects, and in particular to the automatic alignment of an x-ray mask on a semiconductor slice. The present invention utilizes a matching alignment pattern pair for the automatic alignment of an x-ray mask to a semiconductor wafer or disc. A light transmissive pattern which provides orientation in the x-y direction is inscribed on a semiconductor slice. The x-ray mask has a matching pattern which is an opaque or negative pattern with respect to the semiconductor slice pattern. The pattern on the semiconductor slice provides a transmissive window from which the light rays that illuminate the semiconductor slice, can escape. Either The semiconductor slice or the x-ray mask may be automatically moved to minimize the light signal that has passed through first the slice and then the mask.

Descriptors :   *Patents, *Photomasking, *Alignment, Semiconductors, Patterns, Infrared detectors, Matching, X rays

Subject Categories : Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE