Accession Number : ADD009312

Title :   Method of Chemically Polishing Both Sides of an SC-Cut Quartz Crystal Plate.

Descriptive Note : Patent Application,

Corporate Author : DEPARTMENT OF THE ARMY WASHINGTON DC

Personal Author(s) : Vig,John R ; Brandmayr,Ronald J

Report Date : 25 Mar 1982

Pagination or Media Count : 13

Abstract : Both sides of an SC-cut quartz crystal plate whose theta angle is between about -33 degrees and -36 degrees and whose phi angles is between about 20 degrees and 26 degrees are chemically polished by lapping the quartz plate with an abrasive and etching the lapped quartz plate in a 25 to 30 percent solution of hydrofluoric acid (HF) in water, the etching being carried out until surface roughnesses of between 0.05 micrometers and 0.04 micrometers are obtained.

Descriptors :   *Patent applications, *Methodology, *Chemicals, *Polishing, Abrasives, Etching, Hydrofluoric acid, Solutions(Mixtures), Surface roughness, Piezoelectricity, Standards, Crystals, Inventions

Subject Categories : Mfg & Industrial Eng & Control of Product Sys

Distribution Statement : APPROVED FOR PUBLIC RELEASE