Accession Number : ADD009523

Title :   Process for Developing a Negative Electron Resist.

Descriptive Note : Patent Application,

Corporate Author : DEPARTMENT OF THE ARMY WASHINGTON DC

Personal Author(s) : Lai,Juey H

Report Date : 16 Jun 1982

Pagination or Media Count : 8

Abstract : A method of developing a negative electron resist for delineating a desired integrated circuit pattern upon a circuit substrate is disclosed for a negative resist consisting of a copolymer film of (poly(glycidyl methacrylate-co-styrene)) using a mixture of 1:1 chlorobenzene and 2- propanol as the developer. (Author)

Descriptors :   *Patent applications, *Electron beams, *Copolymers, *Film resistors, Lithography, Substrates, Circuits, Integrated circuits, Patterns, Processing, Methacrylates, Solvents, Inventions, Masking, Etching, Plasmas(Physics), Ions

Subject Categories : Coatings, Colorants and Finishes
      Plastics
      Particle Accelerators

Distribution Statement : APPROVED FOR PUBLIC RELEASE