Accession Number : ADD009913

Title :   Hollow Cathode Discharge Source of Metal Vapor.

Descriptive Note : Patent Application,

Corporate Author : DEPARTMENT OF THE ARMY WASHINGTON DC

Personal Author(s) : Henshaw,William F

Report Date : 01 Jun 1982

Pagination or Media Count : 16

Abstract : The present invention relates in general to physical ion depostion devices, and in particular to a new useful hollow cathode discharge vapor source for providing high melting temperature metal vapors for ion plating the inside surfaces of cylinders.

Descriptors :   *Patent applications, *Cathodes(Electron tubes), *Vapor plating, *Metal vapors, Gas discharges, Vapor deposition, Ions, Sputtering, Substrates, Surfaces, Films, High temperature, Rarefied gases

Subject Categories : Electrical and Electronic Equipment
      Fabrication Metallurgy

Distribution Statement : APPROVED FOR PUBLIC RELEASE