Accession Number : ADD010327
Title : Process of and Apparatus for Laser Annealing of Film-Like Surface Layers of Chemical Vapor Deposited Silicon Carbide and Silicon Nitride.
Descriptive Note : Patent Application,
Corporate Author : DEPARTMENT OF THE ARMY WASHINGTON DC
Personal Author(s) : Rose,Douglas N
Report Date : 20 May 1983
Pagination or Media Count : 19
Abstract : A process of an related apparatus for achieving laser annealing of film-like surface layers of chemical vapor deposited silicon nitride and silicon carbide to relieve their inherent residual stresses. A laser beam is used to anneal the layers, in conjunction with a photoacoustic gas cell and related beam modulating means for utilizing a photoacoustic effect principal for monitoring, detecting and effectuating beam control as needed during the laser annealing process.
Descriptors : *Patent applications, *Annealing, *Laser beams, *Silicon carbides, *Silicon nitrides, Methodology, Vapor deposition, Thin films, Argon lasers, Ceramic coatings, Substrates, Acoustics, Optics
Subject Categories : Coatings, Colorants and Finishes
Metallurgy and Metallography
Distribution Statement : APPROVED FOR PUBLIC RELEASE