Accession Number : ADD010327

Title :   Process of and Apparatus for Laser Annealing of Film-Like Surface Layers of Chemical Vapor Deposited Silicon Carbide and Silicon Nitride.

Descriptive Note : Patent Application,

Corporate Author : DEPARTMENT OF THE ARMY WASHINGTON DC

Personal Author(s) : Rose,Douglas N

Report Date : 20 May 1983

Pagination or Media Count : 19

Abstract : A process of an related apparatus for achieving laser annealing of film-like surface layers of chemical vapor deposited silicon nitride and silicon carbide to relieve their inherent residual stresses. A laser beam is used to anneal the layers, in conjunction with a photoacoustic gas cell and related beam modulating means for utilizing a photoacoustic effect principal for monitoring, detecting and effectuating beam control as needed during the laser annealing process.

Descriptors :   *Patent applications, *Annealing, *Laser beams, *Silicon carbides, *Silicon nitrides, Methodology, Vapor deposition, Thin films, Argon lasers, Ceramic coatings, Substrates, Acoustics, Optics

Subject Categories : Coatings, Colorants and Finishes
      Metallurgy and Metallography

Distribution Statement : APPROVED FOR PUBLIC RELEASE