Accession Number : ADD011043
Title : Chemical Vapor Deposition and Reactive Diffusion of Boron on Beryllium.
Descriptive Note : Patent Application,
Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC
Personal Author(s) : Das,D K ; Kumar,K
Report Date : 27 Dec 1983
Pagination or Media Count : 14
Abstract : This abstract discloses a method for depositing boron on a beryllium substrate by using chemical vapor deposition. The method involves treating the surface of a heated beryllium substrate with a mixture of argon and diborane. The substrate is rotated during the chemical vapor deposition for the formation of beryllium boride layer of uniform thickness. The CVD gas mixture is adjusted for improved bonding of the beryllium boride to the substrate and thus improved wear resistance and reduced friction characteristics of the beryllium substrate.
Descriptors : *Patent applications, *Beryllium, *Hardening, *Vapor deposition, *Diffusion, *Boron, *Gas bearings, Wear resistance, Substrates, Friction, Coefficients, Surface finishing, Argon, Diboranes, Mixtures, Borides, Layers, Hardness, Bonding
Subject Categories : Fabrication Metallurgy
Machinery and Tools
Distribution Statement : APPROVED FOR PUBLIC RELEASE