Accession Number : ADD011071
Title : A Photochemical Method for the Separation of Mixtures of Xenon and Krypton.
Descriptive Note : Patent Application,
Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC
Personal Author(s) : Donohue,T ; Geosling,C E
Report Date : 01 May 1984
Pagination or Media Count : 18
Abstract : This invention relates generally to processes for the separation of noble gases and more specifically to processes for the separation of xenon from a gaseous mixture containing krypton. Fluorine is added to the mixture and the resulting mixture then irradiated with light of about 250-370 nm to form crystals of xenon difluoride. The unreacted gases are removed and the remaining crystals are decomposed, typically by thermal means, to yield xenon and fluorine gas. The xenon gas may be easily isolated by conventional means from the fluorine gas. Krypton may also be easily isolated from the remaining gases by conventional means. The process is particularly applicable to the treatment of off gases from a nuclear reactor or reprocessing plant.
Descriptors : *Patent applications, *Photochemical reactions, *Rare gases, *Separation, *Xenon, *Krypton, Gases, Fluorides, Mixtures, Inventions, Crystals, Irradiation, Light
Subject Categories : Industrial Chemistry and Chemical Processing
Mfg & Industrial Eng & Control of Product Sys
Distribution Statement : APPROVED FOR PUBLIC RELEASE