Accession Number : ADD011568
Title : Low Temperature Deposition of Nickel Films.
Descriptive Note : Patent,
Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC
Personal Author(s) : Berry,A D
Report Date : 23 Oct 1984
Pagination or Media Count : 4
Abstract : This invention relates to a low-temperature, electroless process for the plating of nickel metal upon a substrate. NIckel, olefin, and trifluorophosphine vapors are condensed and reacted in a vessel. The reaction product is distilled off and condensed onto the surface of a substrate. The surface is warmed and the reaction product allowed to decompose, yielding a coating of nickel metal upon the substrate, gaseous olefin and Ni(PF3)4.
Descriptors : *Patents, *Electroless plating, *Nickel, Low temperature, Olefin polymers, Fluorophosphines, Vapors, Condensation, Chemical reactions, Distillation, Surfaces, Substrates, Decomposition, Metal coatings, Vacuum distillation
Subject Categories : Fabrication Metallurgy
Distribution Statement : APPROVED FOR PUBLIC RELEASE