Accession Number : ADD011945

Title :   Electrical Method of Making Conductive Paths in Silicon.

Descriptive Note : Patent,

Corporate Author : DEPARTMENT OF THE AIR FORCE WASHINGTON DC

Personal Author(s) : Lane,C H

Report Date : 13 Aug 1985

Pagination or Media Count : 4

Abstract : This patent discloses a method of forming an electrical conductive path between parallel surfaces of a substrate wherein a pulsed voltage, non-current limited, power supply causes aluminum to electromigrate between at least two opposing points to form an alloy with silicon of the substrate. Electronic devices can be thus placed upon opposite sides of the substrate for purposes of packaging, shielding, etc.

Descriptors :   *PATENTS, *CIRCUIT INTERCONNECTIONS, *SUBSTRATES, *SILICON, PACKAGING, ALUMINUM, ELECTRICAL PROPERTIES, CONDUCTIVITY, POWER SUPPLIES, ELECTRONIC EQUIPMENT, PARALLEL ORIENTATION, PULSES, VOLTAGE, SURFACES, SIDES, PATHS

Subject Categories : Electrical and Electronic Equipment
      Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE