Accession Number : ADD011975

Title :   Method of Chemically Polishing Quartz Crystal Blanks.

Descriptive Note : Patent Application,

Corporate Author : DEPARTMENT OF THE ARMY WASHINGTON DC

Personal Author(s) : Brandmayr,Ronald J

Report Date : 30 Sep 1985

Pagination or Media Count : 14

Abstract : The general object of this invention is to provide a method of chemically polishing quartz crystal blanks. A more specific object is to provide such a method wherein the resulting chemically polished blanks will be suitable for use in resonators and oscillators. Quartz crystal blanks are chemically polished by thoroughly cleaning the blanks, treating the quartz crystal blanks with an etching solution at high pressures in a high pressure vessel while agitating to circulate the etchant and maintaining a uniform temperature throughout the etching solution, cooling the vessel, removing the quartz crystal blanks, rinsing thoroughly with water and spinning dry.

Descriptors :   *PATENT APPLICATIONS, *CHEMICAL CLEANING, *POLISHING, *QUARTZ, COOLING, HIGH PRESSURE, PRESSURE VESSELS, CRYSTALS, TEMPERATURE, ETCHING, SOLUTIONS(GENERAL), OSCILLATORS, RESONATORS

Subject Categories : Industrial Chemistry and Chemical Processing
      Crystallography

Distribution Statement : APPROVED FOR PUBLIC RELEASE