Accession Number : ADD012606

Title :   Method of Chemically Polishing Fuzed Quartz.

Descriptive Note : Patent Application,

Corporate Author : DEPARTMENT OF THE ARMY WASHINGTON DC

Personal Author(s) : Brandmayr,Ronald J

Report Date : 20 Oct 1986

Pagination or Media Count : 9

Abstract : The general object of this invention is to provide a method of chemically polishing fused quartz. A more specific object of the invention is to provide such a method that enables one to remove surface damage such as microcracks from the surface of the fused quartz so that a good surface finish is obtained for device fabrication. Fused quartz is chemically polished by lapping the fused quartz, treating the lapped fused quartz with an etchant at high pressure in a high pressure vessel while agitating to circulate the etchant and maintaining a uniform temperature throughout the etchant, cooling the vessel, removing the fused quartz, rinsing thoroughly with water and spinning dry.

Descriptors :   *PATENT APPLICATIONS, *POLISHING, *QUARTZ, SURFACE FINISHING, CRYSTALS, ETCHING, PIEZOELECTRIC CRYSTALS, CRYSTAL OSCILLATORS, COOLING, HIGH PRESSURE, MICROCRACKING, DAMAGE, SURFACES, WATER, FUSED SILICA, PRESSURE VESSELS, TEMPERATURE

Subject Categories : Mfg & Industrial Eng & Control of Product Sys
      Electricity and Magnetism

Distribution Statement : APPROVED FOR PUBLIC RELEASE