Accession Number : ADD012827

Title :   Vanadium Dioxide Film Deposition.

Descriptive Note : Patent,

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s) : Nyberg,Glen A ; Buhrman,Robert A

Report Date : 31 Mar 1987

Pagination or Media Count : 8

Abstract : A method of producing high quality stoichiometric thin films of vanadium dioxide by reactive evaporations utilizes an electron beam to evaporate a source of vanadium in a controlled, low pressure oxygen gas environment with the film being deposited at a predetermined rate onto a substrate which is heated to and maintained at a predetermined temperature above 500 C.

Descriptors :   *PATENTS, *DIOXIDES, *VANADIUM COMPOUNDS, *FILMS, *PATENTS, DEPOSITION, ELECTRON BEAMS, EVAPORATION, REACTIVITIES, SOURCES, SUBSTRATES

Subject Categories : Electrical and Electronic Equipment

Distribution Statement : APPROVED FOR PUBLIC RELEASE