Accession Number : ADD013046

Title :   Photochemical Method for the Separation of Mixtures of Xenon and Krypton.

Descriptive Note : Patent,

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s) : Donohue,Terrence ; Geosling,Christine E

Report Date : 09 Jul 1985

Pagination or Media Count : 5

Abstract : Xenon is isolated from a gaseous mixture containing xenon and kyrpton. Fluorine is added to the mixture and the resulting mixture then irradiated with light of about 250-370 nm to form crystals of xenon difluoride. The unreacted gases are removed and the remaining crystals are decomposed, typically by thermal means, to yield xenon and fluorine gas. The xenon gas may be easily isolated by conventional means from the fluorine gas. Krypton may also be easily isolated from the remaining gases by conventional means. The process is particularly applicable to the treatment of offgases from a nuclear reactor or reprocessing plant.

Descriptors :   *PATENTS, *XENON, *KRYPTON, CRYSTALS, FLUORINE, GASES, NUCLEAR REACTORS, MIXTURES, PHOTOCHEMICAL REACTIONS, YIELD

Subject Categories : Inorganic Chemistry

Distribution Statement : APPROVED FOR PUBLIC RELEASE