Accession Number : ADD013404
Title : Low Temperature Formation of Mullite Using Silicon Alkoxide and Aluminum Alkoxide.
Descriptive Note : Patent, Filed 28 May 86, patented 18 Aug 87,
Corporate Author : DEPARTMENT OF THE AIR FORCE WASHINGTON DC
Personal Author(s) : Yoldas, Bulent E ; Partlow, Deborah P
Report Date : 18 Aug 1987
Pagination or Media Count : 4
Abstract : This patent discloses a method for preparing mullite (3A1O3.2SiO2) by partially hydrolyzing a dilute silicon alkoxide with the partially hydrolyzed silicon alkoxide, eliminating terminal alkoxide groups and firing the material to about 98c. This invention relates to high purity, stoichiometric aluminum silicate (mullite). Mullite is the most stable compound in the AL2O3-SiO2 system. Considerable amounts of mullite are used to produce refactory bodies designed to withstand high temperatures. Its relatively low thermal coefficient of expansion makes such refractories more resistant to thermal stress in contrast to similar bodies prepared from aluminum oxide materials.
Descriptors : *PATENTS, *ALUMINUM COMPOUNDS, *SILICATES, *CHEMICAL ENGINEERING, ALUMINUM OXIDES, COEFFICIENTS, HIGH RATE, HIGH TEMPERATURE, LOW TEMPERATURE, MATERIALS, PURITY, REFRACTORY MATERIALS, RESISTANCE, STABILITY, STOICHIOMETRY, THERMAL PROPERTIES, THERMAL STRESSES, ALKOXY RADICALS, SILICON, IRON OXIDES, REFRACTORY METALS, FABRICATION
Subject Categories : Industrial Chemistry and Chemical Processing
Ceramics, Refractories and Glass
Distribution Statement : APPROVED FOR PUBLIC RELEASE