Accession Number : ADD013781
Title : Apparatus for Metal Organic Chemical Vapor Deposition.
Descriptive Note : Patent, Filed 14 Jun 86, patented 12 Apr 88,
Corporate Author : DEPARTMENT OF THE AIR FORCE WASHINGTON DC
Personal Author(s) : Weyburne, David W
Report Date : 12 Apr 1988
Pagination or Media Count : 7
Abstract : The invention comprises a MOCVD reactor having a reactor vessel with a gas inlet for injecting metal organic vapor and a gas outlet for exhausting the gas from the reactor vessel after it has passed by a substrate. The substrate is held on a substrate holder and susceptor which heats the substrate to promote metal organic vapor deposition. The MOCVD reactor also comprises a novel vapor delivery system that consists of a series of stacked flat plates positioned about a slotted rod which is connected to the gas inlet. The stacked plates surround rod slot and form a series of flat flow channels to deliver gas from the slotted rod to the vicinity of the substrate. In the preferred embodiment of the invention the gas inlet supplies at least two separate gas streams which are held separately in at least two slotted rods passing through the stacked plates. A series of flat flow channels in the stacked plates provide separate flow paths for the gas streams until they reach the immediate vicinity of the substrate. The retention of the gases in channels and the separation of the streams discourages premature mixing of the gases and prevents the formation of eddy streams which might otherwise interfere with the formation of uniform epitaxial layers and abrupt heterojunctions.
Descriptors : *EPITAXIAL GROWTH, *ORGANOMETALLIC COMPOUNDS, *VAPOR DEPOSITION, *CHEMICAL REACTORS, *SEMICONDUCTORS, *PATENTS, CHANNELS, DELIVERY, EDDIES(FLUID MECHANICS), EDDY CURRENTS, FLAT PLATE MODELS, FLOW, FLOW FIELDS, GASES, HOLDERS, INLETS, LAYERS, METAL VAPORS, MIXING, PLATES, RETENTION(GENERAL), RODS, SEPARATION, SLOTS, STACKING, STREAMS, SUBSTRATES, SUPPLIES, VAPORS, HETEROJUNCTIONS
Subject Categories : Electrical and Electronic Equipment
Solid State Physics
Distribution Statement : APPROVED FOR PUBLIC RELEASE