Accession Number : ADD014208

Title :   Volatile Divalent Metal Alkoxides.

Descriptive Note : Patent Application, Filed 31 Jul 89,

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s) : Purdy, Andrew ; Berry, Alan

Report Date : 31 Jul 1989

Pagination or Media Count : 19

Abstract : This invention relates to volatile divalent metal alkoxides useful for the CVD deposition of metal oxides to a substrate. More particularly, this invention relates to volatile alkoxides of barium, strontium, or calcium used to deposit oxides used to make thin, superconducting copper oxide films. The precursors have the formula M (OR)2, wherein M is selected from the group consisting of Barium, Calcium, and Strontium, and R is selected from the group consisting of unsubstituted alkyl groups of 6 to 13 carbons and halogen substituted alkyl groups of 3 to 4 carbons wherein the halogen is selected from two of the halogen substitutions are fluorine. The secondary or tertiary alkyl groups are preferred and the tertiary alkyl groups are most preferred. Keywords: Chemical vapor deposition, Patent applications. (aw)

Descriptors :   *ALKYL RADICALS, *METAL COMPOUNDS, *OXIDES, *VAPOR DEPOSITION, *PATENT APPLICATIONS, *THIN FILMS, *SUPERCONDUCTIVITY, CALCIUM, CHLORINE, DEPOSITION, HALOGENS, SUBSTITUTES, SECONDARY, SUBSTRATES, BARIUM, CHEMICAL REACTIONS, DEPOSITS, FLUORINE, STRONTIUM, SUPERCONDUCTORS, COPPER COMPOUNDS, VALENCE, VOLATILITY

Subject Categories : Solid State Physics
      Electricity and Magnetism

Distribution Statement : APPROVED FOR PUBLIC RELEASE