Accession Number : ADD014596

Title :   An X-Ray Source for Lithography.

Descriptive Note : Patent Application, Filed 9 May 90,

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s) : Sprangle, Phillip ; Hafizi, Bahman ; Mako, Frederick

Report Date : 09 May 1990

Pagination or Media Count : 21

Abstract : This patent application discloses an x-ray lithography device in which a beam of electrons interacts with a microwave field of a quasi-optical maser such as a quasi-optical gyrotron. This maser comprises a pair of spaced mirrors defining a quasi-optical cavity there between, with one mirror being provided with an orifice to permit extraction of the x-ray beam produced. A Bragg reflector is connected to the mirror orifice to reduce the microwave power loss from the device through the orifice. Electrons injected in the maser cavity are caused to 'wiggle' by the interacting microwave field, which functions as an undulator, so as to produce a non-coherent x-ray beam that travels along the longitudinal axis of the cavity and exits through the mirror orifice. (rh)

Descriptors :   AXES, BRAGG ANGLE, CAVITIES, ELECTROMAGNETIC FIELDS, ELECTRONS, INCOHERENCE, INTERACTIONS, LENGTH, LITHOGRAPHY, LOSSES, MASERS, MICROWAVES, MIRRORS, ORIFICES, PATENT APPLICATIONS, RADIOFREQUENCY POWER, REFLECTORS, SOURCES, TRAVEL, X RAYS, AXES, BRAGG ANGLE, CAVITIES, ELECTROMAGNETIC FIELDS, ELECTRONS, INCOHERENCE, INTERACTIONS, LENGTH, LITHOGRAPHY, LOSSES, MASERS, MICROWAVES, MIRRORS, ORIFICES, PATENT APPLICATIONS, RADIOFREQUENCY POWER, REFLECTORS, SOURCES, TRAVEL, X RAYS

Subject Categories : Mfg & Industrial Eng & Control of Product Sys
      Nuclear Physics & Elementary Particle Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE