Accession Number : ADD015414
Title : Lithographic Mask and Method for Fabrication Thereof.
Descriptive Note : Patent Application, Filed 15 May 92,
Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC
Personal Author(s) : Rhee, K W ; Peckerar, M C ; Marrian, C R ; Dobisz, E A
Report Date : 15 May 1992
Pagination or Media Count : 9
Abstract : This invention pertains to improving resolution in making electronic masks. More specifically, this invention pertains to reduction of minimum feature sizes and proximity effects by reducing backscattering of electrons in high voltage electron beam lithography used in making electronic masks. Recently, there has been an interest in the development of x-ray technology as an exposure source in the production of electronic devices, such as integrated circuits. Presently, x-ray lithography is believed to be the most promising path on the horizon for manufacturing integrated circuits of 0.25 micrometers and less. There are still many elements of the lithographic process to be developed in order to meet the goal of manufacturing ultra large scale integrated circuits with feature sizes in the range of 0.10 micrometers.
Descriptors : *LITHOGRAPHY, *PATENT APPLICATIONS, *PROTECTIVE MASKS, *FABRICATION, RESOLUTION, X RAYS
Subject Categories : Protective Equipment
Printing and Graphic Arts
Mfg & Industrial Eng & Control of Product Sys
Distribution Statement : APPROVED FOR PUBLIC RELEASE