Accession Number : ADD015648

Title :   Method of Pattern Transfer in Photolithography Using Laser Induced Metallization.

Descriptive Note : Patent, Filed 28 Sep 90, patented 15 Dec 92,

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s) : Greene, Richard F ; Zahavi, Joseph ; Pehrsson, Pehr E ; Marrian, R

Report Date : 15 Dec 1992

Pagination or Media Count : 7

Abstract : Method for improved photolithography using a laser induced metallization process to produce a metal mask wherein a work piece surface is treated to have a predetermined pattern of at least two materials each having different electron band gaps, the treated work piece is positioned in a metallizing solution, and the workpiece is exposed to a laser beam having a wavelength corresponding to the electron gap of a selected one of the materials. The method can advantageously be used to produce ohmic contacts for microcircuit devices.

Descriptors :   *PHOTOLITHOGRAPHY, *PATENTS, ELECTRONS, LASER BEAMS, LASERS, MASKS, MATERIALS, METALLIZING, METALS, MICROCIRCUITS, PATTERNS, SURFACES, WORK

Subject Categories : Printing and Graphic Arts

Distribution Statement : APPROVED FOR PUBLIC RELEASE